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- W2050943900 abstract "For the in-situ selective-area epitaxy of GaAs, tris-dimethylaminoarsine (TDMAAs) was used in order to reduce the carbon incorporation. Photo-oxidized GaAs was used as a mask. It was found that GaAs was selectively grown in the opening area of the oxide mask at temperatures of less than 420°C without any mask degradation using trimethylgallium (TMG) and TDMAAs. It was confirmed by secondary ion mass spectrometry (SIMS) analysis that the carbon incorporation in the GaAs epitaxial layers became less than the detection limit (∼ 2 × 10 17 atoms / cm 3 ) of SIMS at 390°C, which was lower than that in the case of using As 4 and TMG by two orders of magnitude." @default.
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- W2050943900 date "1995-05-01" @default.
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- W2050943900 title "Reduction of carbon incorporation in the in-situ selective-area epitaxy of GaAs by metalorganic molecular beam epitaxy using tris-dimethylaminoarsine" @default.
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