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- W2051205907 endingPage "1875" @default.
- W2051205907 startingPage "1871" @default.
- W2051205907 abstract "Nanoimprint lithography (NIL), as a promising next generation lithography method, has the advantages of high throughput, sub-10-nm feature and low cost. However, the requirements, such as the structure with high aspect ratio, large area uniformity, and pattern transfer on nonflat surface, have barely been satisfied at the same time. In this study, the authors present a novel fabrication process by introducing a three-mask-layer (TML) Soft UV NIL technique which proves to be a simple and effective method. The initial mold with low aspect ratio can guarantee the imprint uniformity on large area under a high pressure in NIL. Meanwhile, high aspect ratio structure can be easily obtained due to a high etching selectivity of SiO2 to resist in O2 plasma dry etching. Using the proposed technique to fabricate 40 nm gratings with the aspect ratio as high as 6 is proved successful. Uniform photonic crystal (PC) structures with micrometer scale nonflat steps are obtained on large area. The photoluminescence enhancements of the PC light-emitting diode (LED) fabricated by the proposed method to the one with conventional process and un-patterned LED are 1.6 fold and 2.2 fold, respectively." @default.
- W2051205907 created "2016-06-24" @default.
- W2051205907 creator A5001969147 @default.
- W2051205907 creator A5003498053 @default.
- W2051205907 creator A5004202702 @default.
- W2051205907 creator A5005661697 @default.
- W2051205907 creator A5022231767 @default.
- W2051205907 creator A5034056469 @default.
- W2051205907 creator A5049565139 @default.
- W2051205907 creator A5050028682 @default.
- W2051205907 creator A5056709272 @default.
- W2051205907 creator A5077777785 @default.
- W2051205907 creator A5087189780 @default.
- W2051205907 date "2013-03-01" @default.
- W2051205907 modified "2023-10-08" @default.
- W2051205907 title "A Study on the Fabrication of Nanostructures with High Aspect Ratio and Large Area Uniformity" @default.
- W2051205907 doi "https://doi.org/10.1166/jnn.2013.7107" @default.
- W2051205907 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/23755609" @default.
- W2051205907 hasPublicationYear "2013" @default.
- W2051205907 type Work @default.
- W2051205907 sameAs 2051205907 @default.
- W2051205907 citedByCount "5" @default.
- W2051205907 countsByYear W20512059072013 @default.
- W2051205907 countsByYear W20512059072014 @default.
- W2051205907 countsByYear W20512059072016 @default.
- W2051205907 countsByYear W20512059072020 @default.
- W2051205907 crossrefType "journal-article" @default.
- W2051205907 hasAuthorship W2051205907A5001969147 @default.
- W2051205907 hasAuthorship W2051205907A5003498053 @default.
- W2051205907 hasAuthorship W2051205907A5004202702 @default.
- W2051205907 hasAuthorship W2051205907A5005661697 @default.
- W2051205907 hasAuthorship W2051205907A5022231767 @default.
- W2051205907 hasAuthorship W2051205907A5034056469 @default.
- W2051205907 hasAuthorship W2051205907A5049565139 @default.
- W2051205907 hasAuthorship W2051205907A5050028682 @default.
- W2051205907 hasAuthorship W2051205907A5056709272 @default.
- W2051205907 hasAuthorship W2051205907A5077777785 @default.
- W2051205907 hasAuthorship W2051205907A5087189780 @default.
- W2051205907 hasConcept C100460472 @default.
- W2051205907 hasConcept C1291036 @default.
- W2051205907 hasConcept C136525101 @default.
- W2051205907 hasConcept C142724271 @default.
- W2051205907 hasConcept C171250308 @default.
- W2051205907 hasConcept C186187911 @default.
- W2051205907 hasConcept C192562407 @default.
- W2051205907 hasConcept C204223013 @default.
- W2051205907 hasConcept C204787440 @default.
- W2051205907 hasConcept C20788544 @default.
- W2051205907 hasConcept C2777046567 @default.
- W2051205907 hasConcept C2779227376 @default.
- W2051205907 hasConcept C49040817 @default.
- W2051205907 hasConcept C53524968 @default.
- W2051205907 hasConcept C71924100 @default.
- W2051205907 hasConcept C82558694 @default.
- W2051205907 hasConceptScore W2051205907C100460472 @default.
- W2051205907 hasConceptScore W2051205907C1291036 @default.
- W2051205907 hasConceptScore W2051205907C136525101 @default.
- W2051205907 hasConceptScore W2051205907C142724271 @default.
- W2051205907 hasConceptScore W2051205907C171250308 @default.
- W2051205907 hasConceptScore W2051205907C186187911 @default.
- W2051205907 hasConceptScore W2051205907C192562407 @default.
- W2051205907 hasConceptScore W2051205907C204223013 @default.
- W2051205907 hasConceptScore W2051205907C204787440 @default.
- W2051205907 hasConceptScore W2051205907C20788544 @default.
- W2051205907 hasConceptScore W2051205907C2777046567 @default.
- W2051205907 hasConceptScore W2051205907C2779227376 @default.
- W2051205907 hasConceptScore W2051205907C49040817 @default.
- W2051205907 hasConceptScore W2051205907C53524968 @default.
- W2051205907 hasConceptScore W2051205907C71924100 @default.
- W2051205907 hasConceptScore W2051205907C82558694 @default.
- W2051205907 hasIssue "3" @default.
- W2051205907 hasLocation W20512059071 @default.
- W2051205907 hasLocation W20512059072 @default.
- W2051205907 hasOpenAccess W2051205907 @default.
- W2051205907 hasPrimaryLocation W20512059071 @default.
- W2051205907 hasRelatedWork W1538884143 @default.
- W2051205907 hasRelatedWork W2031175500 @default.
- W2051205907 hasRelatedWork W2035960632 @default.
- W2051205907 hasRelatedWork W2063793805 @default.
- W2051205907 hasRelatedWork W2136502888 @default.
- W2051205907 hasRelatedWork W2546606919 @default.
- W2051205907 hasRelatedWork W2890402440 @default.
- W2051205907 hasRelatedWork W2964303512 @default.
- W2051205907 hasRelatedWork W4298206121 @default.
- W2051205907 hasRelatedWork W4367550249 @default.
- W2051205907 hasVolume "13" @default.
- W2051205907 isParatext "false" @default.
- W2051205907 isRetracted "false" @default.
- W2051205907 magId "2051205907" @default.
- W2051205907 workType "article" @default.