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- W2051215287 abstract "A reliable p ohmic contact for AlGaAs/GaAs heterojunction bipolar transistor (HBT) using AuBe-In/Ag/Au is presented. Excellent morphology after annealing at 400 °C for 20 s was observed and a transfer resistance of 0.095 Ω mm obtained on p+-GaAs (1×1019 cm−3). Silver acts as a diffusion barrier to prevent Au spikes which will degrade the performance of the thin base layer HBT. The indium layer is highly desirable to reduce the contact resistance by forming the InGaAs phase at metal-GaAs interfaces. Beryllium is the p-type dopant and a top gold layer is used to lower the sheet resistance of the contact metals. The mode of current transport is dominant by tunneling through the barrier due to field emission in the heavily doped materials." @default.
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- W2051215287 date "1991-03-18" @default.
- W2051215287 modified "2023-10-18" @default.
- W2051215287 title "In‐based<i>p</i>ohmic contacts to the base layer of AlGaAs/GaAs heterojunction bipolar transistor" @default.
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- W2051215287 doi "https://doi.org/10.1063/1.104350" @default.
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