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- W2051218117 abstract "A new method to determine the flat-band voltage V FB in a MOS structure has been proposed. It is based on measuring a voltage which corresponds to a capacitance equal to 0.9 of the oxide capacitance. The method is especially suited for SOI (silicon on insulator) structures, but could be useful in conventional types. In the latter case the error of determination of V FB caused by an uncertainty in doping concentration is smaller than in the classical procedure, especially when the thickness of the dielectric is small." @default.
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- W2051218117 date "1986-09-01" @default.
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- W2051218117 title "New method of determination of the flat-band voltage in SOI MOS structures" @default.
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- W2051218117 doi "https://doi.org/10.1016/0038-1101(86)90019-5" @default.
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