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- W2051219753 abstract "Abstract The electronic properties of ultra-thin vanadium films grown on the Cu(100) surface are studied by means of angular photoemission spectroscopy (ARUPS). Vanadium films with nominal film thickens of 4 ML appear to have fully developed valence band characteristic for the bulk vanadium. Influence of hydrogen on the valence band spectrum of vanadium is discussed. Annealing of the VCu(100) introduces a segregation of copper on top of vanadium film. The copper films produced by the annealing at temperatures below 700 K appear to have different structure than the films obtained after annealing at higher temperatures. The thickness of the copper overlayer is estimated to be 2–3 ML." @default.
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- W2051219753 date "1998-07-01" @default.
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- W2051219753 title "Photoemission study of ultra-thin vanadium films on Cu(100)" @default.
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- W2051219753 doi "https://doi.org/10.1016/s0042-207x(98)00049-9" @default.
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