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- W2051229121 abstract "The chemical (electroless) deposition of CdS thin films is discussed and prospects for these thin films in CdS/CdTe-type solar cells are suggested. The method is demonstrated using thin films obtained by a thioureatriethanolamine process. The photocurrent response in these films is explicitly presented. The films obtained in a single dip can be up to 0.5 μm in thickness. The dark resistivity is approximately 108 Ω cm and the air mass (AM) 2 photoresistivity is approximately 10 Ω cm. These resistivity values and the fact that the ratio of the photocurrent to the dark current is usually greater than 107 under AM 2 illumination testify to the good quality of the films. It is hoped that any skepticism on the quality attainable with chemically deposited CdS films will be removed through this report." @default.
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- W2051229121 date "1987-10-01" @default.
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- W2051229121 title "Prospects of chemically deposited Cds thin films in solar cell applications" @default.
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- W2051229121 doi "https://doi.org/10.1016/0379-6787(87)90050-0" @default.
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