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- W2051229606 abstract "A conducting atomic force microscopy (C-AFM) in ultrahigh vacuum (UHV) is used to directly observe the evolution of leakage path in HfO2∕SiO2 stacked gate dielectrics. Thanks to the UHV environment, reproducible results for both positive and negative tip biases are obtained without material formation on the surface, which has been a problem for atmospheric C-AFM. It is found that the density of leakage spots increases exponentially as a function of tip bias and that it is a large factor for leakage current increase." @default.
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- W2051229606 date "2005-02-03" @default.
- W2051229606 modified "2023-10-01" @default.
- W2051229606 title "Evolution of leakage paths in HfO2∕SiO2 stacked gate dielectrics: A stable direct observation by ultrahigh vacuum conducting atomic force microscopy" @default.
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- W2051229606 doi "https://doi.org/10.1063/1.1862779" @default.
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