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- W2051237800 abstract "We have investigated effects of alkoxy-methyl ester as acid labile protecting group on resists characteristics of acryl polymers for the designing of chemical amplification positive-tone resist system. Preparing 2-adamantyloxy methyl methacrylate (AdOMMA) copolymers and resists consisted of these polymer, we have evaluated copolymers properties, exposure sensitivities, resolution, and line edge roughness (LER). AdOMMA copolymers showed a good pattern profile and high resolution. In addition, as compared with 2-methyl-2-admantyl methacrylate (MAdMA) copolymers, AdOMMA copolymers displayed a good LER of 130 nm resist lines, and the observed LER values were 7.6 nm and 5.6 nm, respectively." @default.
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- W2051237800 date "2004-01-01" @default.
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- W2051237800 title "Effects of Protecting Group on Resist Characteristics of Acryl Polymers for 193 nm Lithography" @default.
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- W2051237800 doi "https://doi.org/10.2494/photopolymer.17.483" @default.
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