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- W2051256319 abstract "Two generations of transmission molybdenum gratings are realized; the first one made with laser interference lithography (LIL) has 300 nm period and the second one made with extreme UV interference lithography (EUV-IL) using the first one has 150 nm period. This technique is a good alternative to e-beam lithography which inevitably introduces field-stitching errors into the gratings. The idea is to produce a first defect-free grating using LIL and to realize higher resolution gratings by multiplying the frequency of this first grating using EUV-IL. Measurements over a wavelength range that includes the industry standard 13.5 nm show the attainment of diffraction efficiency close to the theoretically expected value of 29% for these phase-gratings." @default.
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- W2051256319 date "2009-04-01" @default.
- W2051256319 modified "2023-09-26" @default.
- W2051256319 title "High diffraction-efficiency molybdenum gratings for EUV lithography" @default.
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- W2051256319 doi "https://doi.org/10.1016/j.mee.2009.02.019" @default.
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