FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W2051269410> ?p ?o ?g. }

• W2051269410 abstract "Ever-tightened design rules and ensuing aggressive OPC features pose significant challenges for wafer fabs in the pursuit of compelling yield and productivity. The introduction of advanced reticles considerably augments the mask error enhancement factor (MEEF) where progressive defects or haze, induced by repeated laser exposure, continue to be a source of reticle degradation threatening device yield. High resolution reticle inspection now emerges as a rescue venue for wafer fabs to assure their photomask integrity during intensive deep UV exposure. Integrated in the high resolution reticle inspection, a MEEF-driven lithographic detector Litho3 can be used run-time to group critical defects into a single bin. Previous investigations evinced that critical defects identified by such detector were directly correlated with defects printed on wafer, upon which fab users can make cogent decisions towards reticle disposition and cleaning therefore reduce cycle time. One of the challenges of implementing such detector resides in the lengthy set up of user-defined parameters, from practitioner standpoint, can considerably extend reticle inspection time and inevitably delay production. To overcome this, an automatic simulation program has been written to optimize Litho3 settings based off a pre-inspection in which only default Litho3 values are needed. Upon completion of the pre-inspection, the images are then scanned and processed to extract the optimal Litho3 parameters that are largely dependent upon the feature size characteristics and local MEEF. Thus optimized Litho3 parameters can then be input into the recipe set up to enable a real-time inspection, as such fab user can timely access the defect criticality information for subsequent defect disposition. In the interest of printability validation, such defect information and associated coordinates can be passed onto defect review via XLINK for further analysis. Corresponding MEEF values are also available for all identified critical defects. Through this automatic program the set up time for Litho3 can be reduced by up to 90%. For high capacity production fabs running a pre-inspection is deemed infeasible; this automatic optimization program can also serve as a direct interpretation of any regular reticle inspection even without invoking Litho3 set up, yet in the end provide output in the context of defect criticality. Results acquired from this program were found in good accordance with those from the real-time Litho3 inspection, for both critical and non-critical layers of 90 nm design node. Such capability allows detailed study of defect criticality in relation to its size, defect optical transmittance, residing surface, its proximity to a printing pattern as well as lithography parameters such as NA and sigma. Furthermore, coupling this automatic program with high resolution inspection also assists in determining lithography process window and an indepth comprehension of defect progression mechanism." @default.
• W2051269410 created "2016-06-24" @default.
• W2051269410 creator A5001820805 @default.
• W2051269410 creator A5023666462 @default.
• W2051269410 creator A5047114956 @default.
• W2051269410 creator A5057362319 @default.
• W2051269410 creator A5059988896 @default.
• W2051269410 creator A5066603655 @default.
• W2051269410 creator A5069167778 @default.
• W2051269410 creator A5075502933 @default.
• W2051269410 creator A5086382572 @default.
• W2051269410 date "2007-10-05" @default.
• W2051269410 modified "2023-10-14" @default.
• W2051269410 title "Automatic optimization of MEEF-driven defect disposition for contamination inspection challenges" @default.
• W2051269410 doi "https://doi.org/10.1117/12.748226" @default.
• W2051269410 hasPublicationYear "2007" @default.
• W2051269410 type Work @default.
• W2051269410 sameAs 2051269410 @default.
• W2051269410 citedByCount "1" @default.
• W2051269410 countsByYear W20512694102012 @default.
• W2051269410 crossrefType "proceedings-article" @default.
• W2051269410 hasAuthorship W2051269410A5001820805 @default.
• W2051269410 hasAuthorship W2051269410A5023666462 @default.
• W2051269410 hasAuthorship W2051269410A5047114956 @default.
• W2051269410 hasAuthorship W2051269410A5057362319 @default.
• W2051269410 hasAuthorship W2051269410A5059988896 @default.
• W2051269410 hasAuthorship W2051269410A5066603655 @default.
• W2051269410 hasAuthorship W2051269410A5069167778 @default.
• W2051269410 hasAuthorship W2051269410A5075502933 @default.
• W2051269410 hasAuthorship W2051269410A5086382572 @default.
• W2051269410 hasConcept C119599485 @default.
• W2051269410 hasConcept C120665830 @default.
• W2051269410 hasConcept C121332964 @default.
• W2051269410 hasConcept C127413603 @default.
• W2051269410 hasConcept C138496976 @default.
• W2051269410 hasConcept C146617872 @default.
• W2051269410 hasConcept C14737013 @default.
• W2051269410 hasConcept C154945302 @default.
• W2051269410 hasConcept C15744967 @default.
• W2051269410 hasConcept C157764524 @default.
• W2051269410 hasConcept C159985019 @default.
• W2051269410 hasConcept C160671074 @default.
• W2051269410 hasConcept C164830781 @default.
• W2051269410 hasConcept C177264268 @default.
• W2051269410 hasConcept C192562407 @default.
• W2051269410 hasConcept C199360897 @default.
• W2051269410 hasConcept C200601418 @default.
• W2051269410 hasConcept C204223013 @default.
• W2051269410 hasConcept C2779227376 @default.
• W2051269410 hasConcept C2780407802 @default.
• W2051269410 hasConcept C41008148 @default.
• W2051269410 hasConcept C53524968 @default.
• W2051269410 hasConcept C555944384 @default.
• W2051269410 hasConcept C76155785 @default.
• W2051269410 hasConcept C78371743 @default.
• W2051269410 hasConcept C79403827 @default.
• W2051269410 hasConcept C94915269 @default.
• W2051269410 hasConceptScore W2051269410C119599485 @default.
• W2051269410 hasConceptScore W2051269410C120665830 @default.
• W2051269410 hasConceptScore W2051269410C121332964 @default.
• W2051269410 hasConceptScore W2051269410C127413603 @default.
• W2051269410 hasConceptScore W2051269410C138496976 @default.
• W2051269410 hasConceptScore W2051269410C146617872 @default.
• W2051269410 hasConceptScore W2051269410C14737013 @default.
• W2051269410 hasConceptScore W2051269410C154945302 @default.
• W2051269410 hasConceptScore W2051269410C15744967 @default.
• W2051269410 hasConceptScore W2051269410C157764524 @default.
• W2051269410 hasConceptScore W2051269410C159985019 @default.
• W2051269410 hasConceptScore W2051269410C160671074 @default.
• W2051269410 hasConceptScore W2051269410C164830781 @default.
• W2051269410 hasConceptScore W2051269410C177264268 @default.
• W2051269410 hasConceptScore W2051269410C192562407 @default.
• W2051269410 hasConceptScore W2051269410C199360897 @default.
• W2051269410 hasConceptScore W2051269410C200601418 @default.
• W2051269410 hasConceptScore W2051269410C204223013 @default.
• W2051269410 hasConceptScore W2051269410C2779227376 @default.
• W2051269410 hasConceptScore W2051269410C2780407802 @default.
• W2051269410 hasConceptScore W2051269410C41008148 @default.
• W2051269410 hasConceptScore W2051269410C53524968 @default.
• W2051269410 hasConceptScore W2051269410C555944384 @default.
• W2051269410 hasConceptScore W2051269410C76155785 @default.
• W2051269410 hasConceptScore W2051269410C78371743 @default.
• W2051269410 hasConceptScore W2051269410C79403827 @default.
• W2051269410 hasConceptScore W2051269410C94915269 @default.
• W2051269410 hasLocation W20512694101 @default.
• W2051269410 hasOpenAccess W2051269410 @default.
• W2051269410 hasPrimaryLocation W20512694101 @default.
• W2051269410 hasRelatedWork W1989677737 @default.
• W2051269410 hasRelatedWork W1991382725 @default.
• W2051269410 hasRelatedWork W2012334830 @default.
• W2051269410 hasRelatedWork W2013594656 @default.
• W2051269410 hasRelatedWork W2026539149 @default.
• W2051269410 hasRelatedWork W2040228673 @default.
• W2051269410 hasRelatedWork W2045395664 @default.
• W2051269410 hasRelatedWork W2074870341 @default.
• W2051269410 hasRelatedWork W2351997809 @default.
• W2051269410 hasRelatedWork W2526713846 @default.
• W2051269410 isParatext "false" @default.
• W2051269410 isRetracted "false" @default.
• W2051269410 magId "2051269410" @default.

• next