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• W2051279539 abstract "A far-field optical lithography is developed in this paper. By designing the structure of a far-field optical superlens, lithographical resolution can be improved by using a conventional UV light source. The finite different time domain numerical studies indicate that the lithographic resolution at 50 nm line width is achievable with the structure shown in this paper by using 365 nm wavelength light, and the light can be transferred to a far distance in the photoresist." @default.
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• W2051279539 date "2010-03-01" @default.
• W2051279539 modified "2023-09-23" @default.
• W2051279539 title "Far-field superlens for nanolithography" @default.
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• W2051279539 doi "https://doi.org/10.1088/1674-1056/19/3/034202" @default.
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