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- W2051289484 abstract "Abstract A novel nanocomposite consisting of methacrylate modified nano-SiO 2 (SiO 2 MA) and acrylic prepolymer (G-ACP) was found a potential candidate as a negative photoresist. The SiO 2 MA was synthesized from glycidyl methacrylate (GMA), 3-aminpropyltriethoxysilane (KH550) and a pre-synthesized nano-SiO 2 through the sol–gel process. G-ACP was synthesized through radical polymerization of five monomers, followed by grafting with carboxyl and methacrylate group. The molecular structures of monomers and polymers were characterized by FT-IR and 1 H NMR spectroscopy. Finally, SiO 2 MA was added into G-ACP in different contents and treated with a standard thermal and UV-exposure process to obtain a series of cured organic–inorganic nanocomposite photoresists. The formed nanocomposite photoresists exhibited improved photosensitivity and had a low D n 0 .5 of 26.8 mJ cm −2 with 13.7 wt% SiO 2 MA. Moreover, the thermal and mechanical properties also showed great enhancement while all of the photoresists had a nice line pattern of less than 25 μm." @default.
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- W2051289484 date "2014-02-01" @default.
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- W2051289484 title "A novel acrylic prepolymer/methacrylate modified nano-SiO2 composite used for negative photoresist" @default.
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- W2051289484 doi "https://doi.org/10.1016/j.materresbull.2013.11.024" @default.
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