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• W2051533317 abstract "The as-deposited stress in sputtered, 75-Å-period Mo/Si multilayers was measured to be approximately −350 MPa (compressive), and relaxed to approximately −150 MPa after thermal cycling to 200 °C. The multilayer period was found to decrease by 0.25 Å as a result of thermal cycling, with only a slight decrease in peak soft-x-ray reflectance. The stress-temperature behavior of individual Mo and Si films was also measured, and correlated with the multilayer behavior: stress relaxation in the multilayer is attributed to viscous flow associated with defect annihilation, occurring predominantly in the amorphous Si layers." @default.
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• W2051533317 date "1992-06-22" @default.
• W2051533317 modified "2023-10-01" @default.
• W2051533317 title "Stress relaxation in Mo/Si multilayer structures" @default.
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• W2051533317 doi "https://doi.org/10.1063/1.106771" @default.
• W2051533317 hasPublicationYear "1992" @default.
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