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- W2051569136 abstract "The change in electrical resistance of thin Ag, Au, Ti, and W films was studied following energetic A+ ion bombardment. There is an initial reduction in film resistance (for all materials) during bombardment, which is attributed to removal of surface contaminant gas. The resistance then increases to a quasiequilibrium value, which is believed to be due to introduction of radiation damage to the films, and finally the resistance increases rapidly as the films sputter and thin." @default.
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- W2051569136 date "1967-02-01" @default.
- W2051569136 modified "2023-09-26" @default.
- W2051569136 title "ELECTRICAL RESISTIVITY CHANGES IN THIN METALLIC FILMS DUE TO ION IRRADIATION" @default.
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- W2051569136 doi "https://doi.org/10.1063/1.1754865" @default.
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