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• W2051574654 abstract "Abstract An in situ study of low pressure hydrogen, silane and disilane chemisorption on amorphized state silicon surfaces is presented. Only characteristic signatures of mono and dihydride phases are detected. At room temperature, sticking of SiH2 and (SiH2)2 species for SiH4 and Si2H6, respectively, are proposed. The characteristic peak of the SiSi bond in the disilane molecule is detected and supports the author's assumptions. Decomposition of (SiH2)2 groups allows the growth of a polysilane as observed in a-Si:H materials." @default.
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• W2051574654 date "1991-11-01" @default.
• W2051574654 modified "2023-09-22" @default.
• W2051574654 title "Comparative photoemission study of low pressure hydrogen, silane and disilane adsorption on amorphized silicon" @default.
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• W2051574654 doi "https://doi.org/10.1016/0022-3093(91)90426-7" @default.
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