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- W2051731229 abstract "This paper presents a detailed study of thin Co films grown directly, sequentially, and by codeposition with Si on the $(sqrt{3}ifmmodetimeselsetexttimesfi{}sqrt{3})ensuremath{-}R30ifmmode^circelsetextdegreefi{}$ surface of $6Hensuremath{-}mathrm{SiC}(0001).$ The structure, chemistry, and morphology of the films were determined using x-ray absorption fine structure, x-ray photoelectron spectroscopy, Auger electron spectroscopy, and atomic force microscopy. For directly deposited Co films (1--8 nm) graphite layers form on top of the film surface during annealing, whereas Co stays mainly unreacted over a temperature range of 300--1000 ifmmode^circelsetextdegreefi{}C. The formation of ${mathrm{CoSi}}_{2}$ is achieved by sequential and codeposition of Co and Si. Films annealed at 550 ifmmode^circelsetextdegreefi{}C are polycrystalline and further annealing to 650 ifmmode^circelsetextdegreefi{}C causes no C segregation, but there is islanding of the films. Attempts to improve film morphology and homogeneity including applying a template method and varying growth temperature are also reported." @default.
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- W2051731229 date "2001-03-01" @default.
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- W2051731229 title "Formation of cobalt disilicide films on<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML display=inline><mml:mo>(</mml:mo><mml:msqrt><mml:mrow><mml:mn>3</mml:mn></mml:mrow></mml:msqrt><mml:mo>×</mml:mo><mml:msqrt><mml:mrow><mml:mn>3</mml:mn></mml:mrow></mml:msqrt><mml:mo>)</mml:mo><mml:mn>6</mml:mn><mml:mi>H</mml:mi><mml:mo>−</mml:mo><mml:mi mathvariant=normal>SiC</mml:mi><mml:mn /><mml:mo>(</mml:mo><mml:mn>0001</mml:mn><mml:mo>)</mml:mo><mml:mn /></mml:math>" @default.
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- W2051731229 doi "https://doi.org/10.1103/physrevb.63.115312" @default.
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