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• W2051737206 abstract "Chlorine contamination accelerates the oxidation of silicon-based ceramics through the formation of volatile silicon chloride or silicon oxychloride species which degrade the protective character of the SiO2 film. Accelerated attack may occur by active corrosion or formation of bubbles in the oxide layer. Si3N4 is much more resistant to this attack than either silicon or SiC. This resistance may be related to the presence of a thin silicon oxynitride layer below the SiO2 scale which forms on Si3N4." @default.
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• W2051737206 date "1993-06-01" @default.
• W2051737206 modified "2023-09-26" @default.
• W2051737206 title "Oxidation of Silicon, Silicon Carbide, and Silicon Nitride in Gases Containing Oxygen and Chlorine" @default.
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• W2051737206 doi "https://doi.org/10.1111/j.1151-2916.1993.tb03952.x" @default.
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