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• W2051834582 abstract "A new application of the combination of soft lithography and solventless polymerization is described (see Figure)—the patterning of ultra-hard microstructures in selected areas using highly oriented polyacetylene (HOPA) films as a precursor. It is expected that this simple, low-cost, and mild process will lead to the formation of highly oriented films of other materials, e.g., electro-optically active polymers." @default.
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• W2051834582 date "2004-08-04" @default.
• W2051834582 modified "2023-10-01" @default.
• W2051834582 title "Using Soft Lithography to Pattern Highly Oriented Polyacetylene (HOPA) Films via Solventless Polymerization" @default.
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• W2051834582 doi "https://doi.org/10.1002/adma.200400768" @default.
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