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- W2051930418 abstract "In this paper, we present passive temperature compensation by means of silicon dioxide. Using an oxide refilling technique it avoids gap distance reduction and therefore prevents degradation of electromechanical coupling and motional resistance of the micro-electromechanical resonator. Samples are fabricated and electrically characterized to demonstrate the feasibility of the process concept. A constant quality factor (Q) and only a slight increase of the series resistance value (R m ) are achieved, while the frequency inaccuracy due to temperature variation is reduced. ANSYS simulations are carried out to evaluate the potential of the technique, resulting in a remaining inaccuracy of less than 40ppm." @default.
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- W2051930418 date "2009-01-01" @default.
- W2051930418 modified "2023-09-26" @default.
- W2051930418 title "Temperature Compensation in Silicon-Based Micro-Electromechanical Resonators" @default.
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- W2051930418 doi "https://doi.org/10.1109/memsys.2009.4805525" @default.
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