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- W2052196060 abstract "Templates for UV-Nano-imprint lithography (NIL) have developed aggressively. Feature sizes of the templates havecome to less than 30 nm. Therefore metrology is also one of challenging items to fabricate templates for UV-NIL.However, there are many issues in metrology for the templates, for instance, necessity of the further resolution formeasurement tools, charging issues without conductive layers for a SEM.In this paper, we will focus on metrology of the templates for UV-NIL. And also some measurement techniques aredescribed about detail results using scanning probe microscope, CD-SEM, scattermetry and so on." @default.
- W2052196060 created "2016-06-24" @default.
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- W2052196060 date "2007-10-05" @default.
- W2052196060 modified "2023-09-23" @default.
- W2052196060 title "Metrology for templates of UV nano imprint lithography" @default.
- W2052196060 doi "https://doi.org/10.1117/12.746802" @default.
- W2052196060 hasPublicationYear "2007" @default.
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