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- W2052204941 abstract "Lamellar structures consisting of alternate p- and n-type silicon layers were fabricated by migrating molten aluminum-rich wires through n-type silicon wafers in a thermal gradient. The recrystallized material deposited behind the molten wires was p type. An aluminum-dopant concentration profile was calculated which was consistent with the measured electrical characteristics of the lamellar structures. Lamellar devices made from these structures can be used as vertical multijunction solar cells, high-voltage diodes, surge protectors, and negative-incremental resistors." @default.
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- W2052204941 date "1977-09-01" @default.
- W2052204941 modified "2023-09-26" @default.
- W2052204941 title "Lamellar devices processed by thermomigration" @default.
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- W2052204941 doi "https://doi.org/10.1063/1.324270" @default.
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