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- W2052403628 abstract "The evolution of hillocks on (100)-silicon etched in 4 wt% tetramethyl ammonium hydroxide is studied through a detailed examination of hillock size distribution and individual hillock features using low-voltage scanning electron microscopy. Silicon samples etched for periods of 1.5, 3 and 5 min show that the population of hillocks initially comprises small, square-based pyramids with a wide distribution of aspect ratios ranging up to tall pyramids typifying {111}-bounded pyramids. As etching progresses, the population extends to larger pyramids, the majority of which are somewhat flatter than expected of {111}-bounded pyramids. Detailed examination of individual hillocks suggests that some {111}-bounded pyramids undergo a transformation that eventually leads to a quasi-stable bow-faced hillock configuration. Others collapse from the apex through erosion of the main faces. A number of dissolution routes are observed, and it is postulated that a hillock may undergo a series of fast transformations during its lifetime with intermediate configurations that are quasi-stable." @default.
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- W2052403628 date "2000-12-07" @default.
- W2052403628 modified "2023-10-17" @default.
- W2052403628 title "Evolution of hillocks during silicon etching in TMAH" @default.
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- W2052403628 doi "https://doi.org/10.1088/0960-1317/11/1/310" @default.
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