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• W2052588051 abstract "We investigated the refractive index variation of r.f.-sputtered SiO2 films in the direction normal to the substrate surface as a function of some important deposition conditions. As confirmed by Rutherford backscattering measurements the impurity content and its distribution over the film thickness profoundly affect the optical homogeneity and the UV absorption of SiO2 films. Homogeneous SiO2 films with refractive indices and transmission properties close to those of fused silica can be prepared by judicious selection of the substrate temperatures. This is possible even under such rough mutual contamination conditions as occur in the fabrication of multilayer stacks." @default.
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• W2052588051 date "1982-11-01" @default.
• W2052588051 modified "2023-09-26" @default.
• W2052588051 title "R.f.-sputtered SiO2 films for optical applications" @default.
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• W2052588051 doi "https://doi.org/10.1016/0040-6090(82)90223-1" @default.
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