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• W2052893009 endingPage "8621" @default.
• W2052893009 startingPage "8621" @default.
• W2052893009 abstract "Reflective color filters using two-dimensional photonic crystals based on sub-wavelength gratings were proposed and constructed. Using low-cost nanoimprint lithography, an amorphous silicon layer was deposited through the low-temperature PECVD process and patterned into two-dimensional structures. The isolated amorphous silicon patterns were readily crystallized using a multi-shot excimer laser annealing at low energy. A study of the close relationship between color filter reflectance and silicon pattern crystallinity is introduced. Theoretical and experimental results show that the proposed color filters have high reflectance and, moreover, decrease the dependence on incident angle compared to one-dimensional photonic crystal color filters." @default.
• W2052893009 created "2016-06-24" @default.
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• W2052893009 date "2009-05-07" @default.
• W2052893009 modified "2023-10-18" @default.
• W2052893009 title "Two-dimensional photonic crystal color filter development" @default.
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• W2052893009 doi "https://doi.org/10.1364/oe.17.008621" @default.
• W2052893009 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/19434195" @default.
• W2052893009 hasPublicationYear "2009" @default.
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