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- W2052893636 abstract "Nickel oxide (NiO) thin films were deposited onto glass substrates by radio-frequency (RF) magnetron sputtering under an RF power of 150 W and 200 W keeping the substrates at room temperature. The optical and microstructural properties of the films were studied by, photoluminescence (PL) and atomic force microscope (AFM), respectively. PL studies exhibited room temperature emission at 535 nm in the visible region. The roughness of surface is more probable to be reduced (0.9 nm) and lead to a dense structure at high RF power (200 W)." @default.
- W2052893636 created "2016-06-24" @default.
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- W2052893636 date "2013-01-01" @default.
- W2052893636 modified "2023-09-25" @default.
- W2052893636 title "Influence of RF power on optical and morphological properties of NiO thin films" @default.
- W2052893636 doi "https://doi.org/10.1063/1.4810376" @default.
- W2052893636 hasPublicationYear "2013" @default.
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