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• W2052975967 abstract "A vertically sensitive acceleration sensor has been fabricated by combining the low-cost UV-LIGA process with a sacrificial layer technique. The key structure of the sensor is an asymmetric proof-mass which is suspended over two stationary electrodes. Because of the asymmetric arrangement of the proof-mass, an acceleration in the Z-direction results in an opposite deflection of its large and small parts. Hence, the acceleration can be detected by the differential capacitor arrangement between the proof-mass and the two stationary electrodes. The fabrication of this vertically sensitive accelerometer is a planar batch procedure comprising only a few processing steps. The entire structures are first grown electrochemically within the UV-patterned thick AZ4562 photoresist on an electroplating base that composes of rigid (Cu) and sacrificial (Ti) layers. Movable Ni-parts are then obtained by removing the underneath titanium sacrificial layer using wet etching. Sensor structures up to 30 μm with an aspect ratio of about 10:1 can be reliably manufactured. It is thought that this fabrication approach can be widely applied to economically realise other micromechanical components with oscillating structures. Design and realisation of the vertically sensitive accelerometer is described in this paper." @default.
• W2052975967 created "2016-06-24" @default.
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• W2052975967 date "2000-07-01" @default.
• W2052975967 modified "2023-09-26" @default.
• W2052975967 title "A vertically sensitive accelerometer and its realisation by depth UV lithography supported electroplating" @default.
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• W2052975967 doi "https://doi.org/10.1016/s0026-2692(00)00031-8" @default.
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