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- W2053005935 abstract "Domain structure in yttrium silicide (YSi2−x) films grown on (100)Si substrates through a solid phase reaction during annealing above 400°C is studied by X-ray diffraction methods. The YSi2−x films on both on-axis substrate and 2°-tilted substrate have a preferred orientation, i.e., the (11oo) plane of the YSi2−x is parallel on to the (100)Si surface and the films consists of two types of domains, i.e., [0001]YSi2−x is parallel to either [011]Si or [011]Si. The ω-mode rocking curve measurements of the (2201)YSi2−x asymmetric reflection show that the volume fractions of two types of domains are almost equal on the on-axis (100)Si substrate and have a difference of about 30% on the tilted substrate. The formation of a double-domain structure is discussed on the basis of geometrical matching at inferface between (1100)YSi2−x film and the (100)Si substrate, and a growth model is proposed." @default.
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- W2053005935 date "1993-11-01" @default.
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- W2053005935 title "An X-ray analysis of domain structure in epitaxial YSi2−x films grown on (100)Si substrates" @default.
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- W2053005935 doi "https://doi.org/10.1016/0965-9773(93)90034-9" @default.
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