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- W2053231146 abstract "Abstract Thin films of copper indium diselenide are deposited on Ti substrates by a simple and inexpensive electroless technique. The compositional, structural and morphological properties of the as such and annealed films are studied. The films are of single phase and chalcopyrite structure with (112) preferred orientation. The morphology of the films is found sensitive to the Cu/In ratio." @default.
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- W2053231146 date "1991-12-01" @default.
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- W2053231146 title "Electroless deposition of copper indium diselenide thin films" @default.
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- W2053231146 doi "https://doi.org/10.1016/0025-5408(91)90148-f" @default.
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