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- W2053406562 abstract "Chemical Vapor Deposition (CVD) is a versatile and efficient technique for thin film deposition in the microelectronics, electro-optics, tool and protective coatings industries. This technology has been adapted by several groups to the preparation of optical thin films. We report on several CVD thin films stacks for photothermal solar energy conversion which combine promising spectral selectivity and durability at elevated operating temperatures." @default.
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- W2053406562 date "1985-05-01" @default.
- W2053406562 modified "2023-09-27" @default.
- W2053406562 title "Spectrally selective surfaces by chemical vapor deposition" @default.
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- W2053406562 doi "https://doi.org/10.1016/0165-1633(85)90027-9" @default.
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