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- W2053463779 abstract "Nanostructure films, consisting of TiN and Ni, were obtained by filtered vacuum arc deposition. The TiN-Ni nanostructure film is expected to have superior mechanical properties. In this method, Ti metal ions and Ni metal ions were alternately introduced to the substrate along a magnetic field sustained in the quarter-torus. The nanoparticle structure and the multilayer structure could be obtained. The TED pattern indicated that the crystallographic orientations of TiN and Ni were aligned, TiN(111) //Ni(111), TiN(100) //Ni (100). The thermal stability of the nanostructure and the film hardness were investigated up to 1053 K. It was confirmed that the nanostructure and the film hardness were stable up to 973 K. The nanostructure was effective for improvement of hardness." @default.
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- W2053463779 date "1998-07-01" @default.
- W2053463779 modified "2023-09-25" @default.
- W2053463779 title "The production and properties of TiN-Ni nanostructure films by filtered vacuum arc deposition" @default.
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- W2053463779 doi "https://doi.org/10.1016/s0254-0584(98)00111-4" @default.
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