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- W2053646061 abstract "We have developed a method of using Ar ion milling and SEM to visualize the cross section of blockcopolymer films that were 50 nm thick. Directed assembly of lamellae-forming PS-b-PMMA on one-to-one and two-to-one chemical patterns was studied by both experiment and molecular simulation. The density multiplied PMMA domains were distorted and the PS domains had a 'U-shaped' structure on the substrate." @default.
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- W2053646061 date "2010-01-01" @default.
- W2053646061 modified "2023-10-17" @default.
- W2053646061 title "Cross-sectional Imaging of Block Copolymer Thin Films on Chemically Patterned Surfaces" @default.
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- W2053646061 doi "https://doi.org/10.2494/photopolymer.23.149" @default.
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