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• W2053663434 abstract "Abstract We have investigated by means of atomic force microscopy (AFM) single impacts of slow singly and multiply charged Ar ions on atomically clean insulator surfaces for LiF(1 0 0), SiO2(0 0 0 1) α-quartz, muscovite mica and sapphire c-plane Al2O3(0 0 0 1) crystals. The target samples have been continuously kept under UHV conditions by transferring them in a transportable UHV vault from the vacuum chamber for ion bombardment to the AFM instrument. Slow ion bombardment was accompanied by low-energy electron flooding to compensate for possible target surface charge-up. For Al2O3 clear ion-charge dependent surface defects in lateral and vertical directions give evidence for potential sputtering, which until now has only been demonstrated with thin polycrystalline insulator films." @default.
• W2053663434 created "2016-06-24" @default.
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• W2053663434 date "2003-05-01" @default.
• W2053663434 modified "2023-10-01" @default.
• W2053663434 title "AFM search for slow MCI-produced nanodefects on atomically clean monocrystalline insulator surfaces" @default.
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• W2053663434 doi "https://doi.org/10.1016/s0168-583x(03)00573-1" @default.
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