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- W2053736740 abstract "Two types of test objects for automated measurements of critical dimensions with scanning electron microscopes (SEMs) are described. The first type can be used for SEM calibration along two coordinates in a wide range of magnifications (to perform dimensional measurements in the range from 10 nm to 100 μm without making recalibration), including determination of the electron beam diameter. The second type is recommended for embedding into the integrated circuits (ICs) to monitor the focusing of the SEM electron beam in the course of dimensional measurements of IC elements. Measurement and monitoring of the SEM magnification and electron beam diameter is necessary to measure the linewidth (the sizes of the upper and lower bases of the IC trapezoidal relief elements) in the nanometer range." @default.
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- W2053736740 date "2009-05-21" @default.
- W2053736740 modified "2023-09-23" @default.
- W2053736740 title "Test objects for automated dimensional measurements at the nanoscale level using a scanning electron microscope" @default.
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- W2053736740 doi "https://doi.org/10.1117/12.821759" @default.
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