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- W2053769150 abstract "The current photomask linewidth Standard Reference Material (SRM) supplied by the National Institute of Standardsand Technology (NIST), SRM 2059, is the fifth generation of such standards for mask metrology. An in house opticalmicroscope tool developed at NIST, called the NIST ultra-violet (UV) microscope, was used in transmission mode tocalibrate the SRM 2059 photomasks. Due to the limitations of available optical models for determining the edgeresponse in the UV microscope, the tool was used in a comparator mode.One of the masks was selected as a master standard - and the features on this mask were calibrated using traceablecritical dimension atomic force microscope (CD-AFM) dimensional metrology. The optical measurements were thenused to determine the relative offsets between the widths on the master standard and individual masks for sale tocustomers. At the time of these measurements, however, the uncertainties in the CD-AFM reference metrology on themaster standard were larger than can now be achieved because the NIST single crystal critical dimension referencematerial (SCCDRM) project had not been completed.Using our CD-AFM at NIST, we have performed new measurements on the SRM 2059 master standard. The new AFMresults are in agreement with the prior measurements and have expanded uncertainties approximately one fourth ofthose of the earlier results for sub-micrometer features. When the optical comparator data for customers masks arereanalyzed using these new AFM results, we expect to reduce the combined reported uncertainties for the linewidths onthe actual SRMs by at least 40 % for the nominal 0.25 μm features." @default.
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- W2053769150 date "2008-10-24" @default.
- W2053769150 modified "2023-09-23" @default.
- W2053769150 title "Re-calibration of the NIST SRM 2059 master standard using traceable atomic force microscope metrology" @default.
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- W2053769150 doi "https://doi.org/10.1117/12.801923" @default.
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