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- W2053812689 abstract "For shortening the writing time, especially in shaped Electron Beam Direct Writing (EBDW), it is crucial to reducethe number of shapes and the coverage of layout for exposure. The determination of conventional or reversed imageprinting according to the process integration is one of the concerns for time and cost-effective process in the EBDW. Wehave studied two different cases for the purpose above. First, the proximity effect correction (PEC) with dosemodification applied on each tone of resists, positive and negative, for the printing of conventional and reversed images.The CDs that are obtained from the both printed images compared and are either with that from the simulations.Secondly, the two different types of PEC, dose and shape modification, applied to a conventional image using anidentical point spread function (PSF). The line edge roughness (LER), line width roughness (LWR) and CDs in dose andshape corrected conventional image pattern have been measured and compared. The MGS/PROXECCO was used for allthe preparation of exposure data mentioned above. In summary, we suggest the strategies of efficient PEC for the EBDW of contrasting images, propose the available method of PEC for the time-efficient EBDW, and for the further multiple EBDW developments." @default.
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- W2053812689 date "2010-03-11" @default.
- W2053812689 modified "2023-09-23" @default.
- W2053812689 title "Conventional and reversed image printing in electron beam direct write lithography with proximity effect corrections based on dose and shape modification" @default.
- W2053812689 doi "https://doi.org/10.1117/12.846514" @default.
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