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- W2054089773 abstract "In this article, the polystyrene (PS) microspheres monolayer film was manufactured on silicon substrate by spin-coating, and the effect of PS microspheres concentration on preparation of monolayer film was discussed in detail. With a view to the application of graphic substrate technology, the etching effect with different technological parameter (etching time and power) was researched, and a set of appropriate process parameter were obtained, which met the requirements of preparation of the extension graphics silicon substrate." @default.
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- W2054089773 date "2012-12-01" @default.
- W2054089773 modified "2023-09-27" @default.
- W2054089773 title "Research of Preparation and Etching of PS Microspheres Film" @default.
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- W2054089773 doi "https://doi.org/10.4028/www.scientific.net/amr.602-604.1470" @default.
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