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• W2054222743 endingPage "D482" @default.
• W2054222743 startingPage "D482" @default.
• W2054222743 abstract "In this paper, we report a comparison between deposition by a conventional batch reactor and a newly developed continuous-flow microreactor. This microreactor setup makes use of a micromixer for efficient mixing of the reactant streams and helps in controlling the homogeneous reaction before the solution impinges on a substrate. Transmission electron microscopy analysis indicated that an impinging flux without the formation of nanoparticles could be obtained from this reactor at a short residence time. The surface morphology of the deposited films clearly indicated an improvement of film smoothness and coverage over films deposited from a batch process. Highly oriented nanocrystalline films were obtained from the continuous-flow microreactor in contrast to poor crystalline films from the batch process. This new approach could be adopted for the deposition of other compound semiconductor thin films at low temperatures using a solution-based chemistry with improved control over the processing chemistry." @default.
• W2054222743 created "2016-06-24" @default.
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• W2054222743 date "2007-01-01" @default.
• W2054222743 modified "2023-09-23" @default.
• W2054222743 title "A Comparison of Chemical Bath Deposition of CdS from a Batch Reactor and a Continuous-Flow Microreactor" @default.
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• W2054222743 doi "https://doi.org/10.1149/1.2757012" @default.
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