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• W2054304491 abstract "Abstract The series method of Chen and Chen is re-examined and applied to a variety of redistribution problems. It is seen that this analysis can play an important role in deriving closed-form solutions of the diffusion equation useful in semiconductor technology. In particular, series solutions are formulated for two alternative Si/SiO2 interface boundary conditions. Moreover, taken in conjunction with the Euler transformation it is shown to provide exact solutions to several redistribution problems for a wide class of initial dopant profiles and for realistic diffusion times. All solutions have been compared where ever possible with existing analytical techniques, and in all other cases reference has been made to results obtained from the numerical Crank-Nicolson technique." @default.
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• W2054304491 date "1978-08-01" @default.
• W2054304491 modified "2023-10-03" @default.
• W2054304491 title "Redistribution of dopant impurities in a semiconductor using the series method of Chen and Chen" @default.
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• W2054304491 doi "https://doi.org/10.1016/0038-1101(78)90180-6" @default.
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