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- W2054406876 abstract "By using plasma-enhanced chemical vapor deposition (p-CVD), we grew vertically aligned multiwall carbon nanotubes (CNTs) directly on a nickel-silicide layer, which can be used as electrodes for metal-oxide-semiconductor field-effect transistors (MOSFETs). By using a nickel-silicide layer as a catalyst, the nanotube diameter became smaller than that possible with a nickel film catalyst. We suggest that Ni-silicide composition plays an important role in controlling the diameter of the nanotubes. To our knowledge, this is the first report on diameter-controlled vertically aligned CNT growth on catalytic metal-silicide substrates." @default.
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- W2054406876 date "2003-06-15" @default.
- W2054406876 modified "2023-09-26" @default.
- W2054406876 title "Direct Diameter-Controlled Growth of Multiwall Carbon Nanotubes on Nickel-Silicide Layer" @default.
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- W2054406876 doi "https://doi.org/10.1143/jjap.42.l721" @default.
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