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• W2054582562 abstract "Boron nitride (BN) nanometer thin films are synthesized on Si (1 0 0) substrates by RF reactive magnetron sputtering. Then the film surfaces are treated in the case of the base pressure below 5 × 10−4 Pa and the temperature of 800 and 1000 °C, respectively. And the films are studied by Fourier transform infrared spectra (FTIR), atomic force microscopic (AFM) and field emission characteristics at different annealing temperature. The results show that the surface heat treatment makes no apparent influence on the surface morphology of the BN films. The transformations of the sample emission characteristics have to do with the surface negative electron affinity (NEA) of the films possibly. The threshold electric fields are lower for BN samples without heat-treating than the treated films, which possibly ascribed to the surface negative electron affinity effect. A threshold field of 8 V/μm and the emission current of 80 μA are obtained. The surface NEA is still presence at the heat treatment temperature of 800 °C and disappeared at temperature of 1000 °C." @default.
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• W2054582562 date "2005-01-01" @default.
• W2054582562 modified "2023-09-27" @default.
• W2054582562 title "Influence of heat treatment on field emission characteristics of boron nitride thin films" @default.
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• W2054582562 doi "https://doi.org/10.1016/j.apsusc.2004.06.009" @default.
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