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- W2054694893 abstract "The performance of alternating PSM and its modified type applicable to sub-quarter micron contact holes were studied via both simulations and experiments. We focused on the contact holes as follows: the pitch of one direction was fixed to 0.4micrometers (0.73(lambda) /NA) and the pitches of another direction were varied from 0.4micrometers to 1.6micrometers (2.9(lambda) /NA). Simulations and experiments were performed with a KrF excimer system (0.45 NA and 0.3 coherence factor). The alternating PSM provided benefits in printing highly packed contact holes, whereas the hybrid PSM having a mixed form of alternating PSM and outrigger PSM showed its effects for the contact holes packed only in one direction. It was found that the performance of PSM was strongly affected by duty ratios of the contact holes. In particular, the hybrid PSM improved both the roundness of contact holes and the depth-of- focus, enabling 0.45(lambda) /NA contact holes to be printed. Therefore, either the alternating or the hybrid PSM may extend the lifetime of the optical lithography.© (1996) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only." @default.
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- W2054694893 date "1996-06-07" @default.
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- W2054694893 title "<title>Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes</title>" @default.
- W2054694893 doi "https://doi.org/10.1117/12.240950" @default.
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