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- W2054784145 abstract "The properties of the silicon-silicon nitride system after oxidative annealing are considered. It is shown that the main product of oxidation is silica. Defects in silicon nitride film structures which are mostly caused by carbon are analysed. [Russian text Ignored]" @default.
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- W2054784145 date "1979-02-16" @default.
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- W2054784145 title "The structure of silicon nitride films. III. Oxidation of Silicon Nitride — Defects" @default.
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- W2054784145 doi "https://doi.org/10.1002/pssa.2210510208" @default.
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