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• W2054871520 abstract "The photochemical grafting of methyl groups onto an n-type Si(1 1 1) substrate was successfully achieved using a Grignard reagent. The preparation involved illuminating a hydrogen-terminated Si(1 1 1) that was immersed in a CH3MgBr-THF solution. The success was attributed to the ability of the n-type hydrogenated substrate to produce holes on its surface when illuminated. The rate of grafting methyl groups onto the silicon surface was higher when a larger illumination intensity or when a substrate with lower dopant concentration was used. In addition, the methylated layer has an atomically flat structure, has a hydrophobic surface, and has electron affinity that was lower than the bulk Si." @default.
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• W2054871520 date "2013-12-01" @default.
• W2054871520 modified "2023-09-25" @default.
• W2054871520 title "Photochemical grafting of methyl groups on a Si(111) surface using a Grignard reagent" @default.
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• W2054871520 doi "https://doi.org/10.1016/j.jcis.2013.08.035" @default.
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