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• W2054991551 abstract "N doped TiO2 films were deposited by direct current pulse magnetron sputtering system at room temperature. By using UV-Vis spectrophotometer and atomic force microscope, we studied the influence of N2 flow rate on the optical property and surface morphology of films. The results indicate that the optical property and surface morphology of N doped TiO2 film was dominated by the N2 flow rate. The mean absorbency in visible range of pure TiO2 films is near to 0%, which means that the pure TiO2 could hardly display the photocatalytic property in visible range. When N2 flow rate is 2 sccm, the mean absorbency in visible range of N doped TiO2 film could reach at 24%. In this case, the film could be used as photocatalyst induced by visible light. While with increasing N2 flow rate, the mean absorbency in visible range of N doped TiO2 film decreased abruptly. Especially when N2 flow rate exceeded 8 sccm, the mean absorbency in visible range of N doped TiO2 film decreased to about 0%, which is like pure TiO2 fimls." @default.
• W2054991551 created "2016-06-24" @default.
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• W2054991551 date "2013-12-01" @default.
• W2054991551 modified "2023-10-07" @default.
• W2054991551 title "Study on the optical property and surface morphology of N doped TiO2 film deposited with different N2 flow rates by DCPMS" @default.
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• W2054991551 doi "https://doi.org/10.1016/s1001-0742(14)60626-4" @default.
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