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- W2055271812 abstract "This paper describes the effect of annealing on ultrathin oxynitride films on Si(100) surface prepared by the dissociative interaction of nitric oxide (NO) at room temperature. Ultraviolet and X-ray photoelectron spectroscopy (UPS and XPS) and Auger electron spectroscopy (AES) have been employed to understand the clustering phenomenon of approximately monolayer thick oxynitride layer. On annealing the oxynitride at ∼500°C, nitrogen atoms move preferentially towards the interface. In the UPS, absence of the reappearance of surface states even after annealing the oxynitride to ∼720°C suggests a resistance to clustering of the oxynitride layer. This is in contrast to the annealing behavior of pure SiO2 film where clustering begins at temperatures as low as 190°C. On further annealing of the oxynitride film at 830°C, the SiN species remain on the surface due to the selective desorption of SiO species. Upon exposing oxygen to this surface, selective adsorption takes place on the bare Si areas exposed by the desorption of SiO. We believe that the enhanced thermal stability of ultrathin silicon oxynitride is due to the stabilization of the interface by the nitrogen atoms incorporated preferentially at the Si/SiO2 interface." @default.
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- W2055271812 date "1998-06-01" @default.
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- W2055271812 title "Improved thermal stability of ultrathin silicon oxynitride layer due to nitrogen incorporation at the interface" @default.
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- W2055271812 doi "https://doi.org/10.1016/s0169-4332(98)00047-6" @default.
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