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- W2055367465 abstract "Abstract Electrodeposited hard chrome has been ion implanted with nitrogen alone, boron alone, and a combination of nitrogen and boron. Separately, nitrogen and boron implantation was carried out at 75 keV and incident doses of 2, 4 and 8×10 17 at cm −2 . Samples implanted with both nitrogen and boron used beam energies of 75 keV and incident dose levels of 4×10 17 N-at cm −2 and 4×10 17 B-at cm −2 . All ion implantations were accomplished using a beam-line system. The retained dose was measured using ion beam analysis. Surface hardness, wear coefficient and the coefficient of friction were determined by nanohardness indentation and pin-on-disk wear testing of each sample. Ion beam analysis indicated a majority of the incident dose was retained. At a depth of 50 nm, the surface hardness increased from 18±1 GPa for unimplanted chrome, to a maximum of 23±4 GPa for boron implanted chrome and 26±1 GPa for nitrogen implanted chrome. Pin-on-disk wear testing indicated reductions in the wear coefficient by factors of 1.3–7.4, depending on the implantation treatment. It is shown that nitrogen implantation of chromium results in lower wear coefficients than boron implantation." @default.
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- W2055367465 date "1997-12-01" @default.
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- W2055367465 title "Nitrogen and boron ion implantation into electrodeposited hard chrome" @default.
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- W2055367465 doi "https://doi.org/10.1016/s0257-8972(97)00194-1" @default.
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