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- W2055660865 abstract "We present here characterization data on (1.3 μm composition) In0.73Ga0.27As0.60P0.40/InP epitaxial layers that were grown in a vertical low pressure MOCVD reactor. Characterization data include determination of the photoluminescence wavelengths and efficiency, X-ray rocking curves, and sputter Auger depth profiles. In particular, we find that the data are sensitive to the effect of susceptor height, as well as the growth interrupt time between epilayers, due mainly to variations in interfacial abruptness. We also present device testing results on 1.3 μm planar capped mesa buried heterostructure lasers that were fabricated from the base material grown by this technique." @default.
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- W2055660865 date "1991-05-01" @default.
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- W2055660865 title "Low pressure MOCVD in a vertical reactor: growth and characterization of InGaAsP on (100)InP for 1.3 μm lasers" @default.
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- W2055660865 doi "https://doi.org/10.1016/0022-0248(91)90910-w" @default.
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