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- W2055785622 abstract "A new approach for submonolayer controlled growth using short-pulse supersonic nozzle beam epitaxy (SSBE) was demonstrated. The growth behavior of GaAs was studied by reflection high-energy electron diffraction. As the pulse width of trimethylgallium source was increased from 5 to several hundred ms, a systematic change in the specular beam intensity and in the diffraction pattern was observed. The results showed that the epitaxial growth was easily controlled on a submonolayer level by simply adjusting the pulse width and by counting the number of short pulses. This suggests that the SSBE has the ability to manipulate atomic arrays in the realization of highly confined nanostructure fabrication." @default.
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- W2055785622 date "1994-02-28" @default.
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- W2055785622 title "Short-pulse supersonic nozzle beam epitaxy: A new approach for submonolayer controlled growth" @default.
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