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- W2056096039 abstract "Low-temperature molecular-beam epitaxy of Si is characterized by the existence of an epitaxial thickness ${mathit{h}}_{mathrm{epi}}$, below which the film is epitaxial and above which the film turns amorphous. Epitaxial films with a thickness beyond ${mathit{h}}_{mathrm{epi}}$ can be grown, provided a rapid-thermal-anneal (RTA) step to a sufficient temperature, ${mathit{T}}_{mathrm{RTA}}$, is executed before reaching ${mathit{h}}_{mathrm{epi}}$. Positron-annihilation spectroscopy shows that ${mathit{T}}_{mathrm{RTA}}$=450 ifmmode^circelsetextdegreefi{}C is not sufficient but 500 ifmmode^circelsetextdegreefi{}C is. We explain this cutoff in RTA temperature using a model based on Si-H bond breaking. Nuclear reactions analysis support this model and show a high concentration of hydrogen in films grown with RTA below 450 ifmmode^circelsetextdegreefi{}C. According to the proposed model, a reduction of the hydrogen content in the growth ambient should lead to larger ${mathit{h}}_{mathrm{epi}}$." @default.
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- W2056096039 date "1995-02-15" @default.
- W2056096039 modified "2023-09-27" @default.
- W2056096039 title "Hydrogen-induced breakdown of low-temperature molecular-beam epitaxy of Si" @default.
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- W2056096039 doi "https://doi.org/10.1103/physrevb.51.4630" @default.
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