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- W2056118081 abstract "Treatments by femtosecond Ti-sapphire laser (wavelength is 800 nm, pulse duration is <30 fs) and nanosecond KrF excimer laser (wavelength is 248 nm, pulse duration is 25 ns) were performed to study the impact of laser fluence, pulse duration and energy of photons on the process of chemical and structural reconstructions in GeO<sub>x</sub> and GeO<sub>2</sub>:Ge heterolayers. The solid GeO<sub>x</sub> films are metastable and decompose into two phases - Ge and GeO<sub>2</sub>. Nanosecond KrF laser irradiation produces significant shrinkage of GeO<sub>x</sub> films and GeO<sub>2</sub>:Ge heterolayers caped by thin SiN<sub>x</sub>O<sub>y</sub> or SiO<sub>2</sub> films. Pulse annealing by both types of lasers stimulate as the process of nanoclusters forming and crystallization of initial amorphous Ge-nanoclusters in the GeO<sub>2</sub> matrix. The possibility to use the solid germanium monoxide (GeO(s)) and GeO<sub>2</sub>:Ge heterolayers (without cap layers) as nano-resist in laser nanolithography was demonstrated. The new nanostructured material was formed - the layers of nanofoam GeO<sub>2</sub> which can be obtained only with application of femtosecond laser pulse treatments." @default.
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- W2056118081 date "2010-09-10" @default.
- W2056118081 modified "2023-10-18" @default.
- W2056118081 title "Laser treatment of the heterolayers GeO 2 :Ge-QDs" @default.
- W2056118081 doi "https://doi.org/10.1117/12.882043" @default.
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